Optics & Photonics News

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Sumitomo's PureAccess-R5 Optical Fiber Complies with New ITU-T G.657.B3 Standard

Sumitomo Electric Industries, Ltd. (TOKYO:5802) (ISIN:JP3407400005), a leading global developer and manufacturer of optical fiber, cable and components as well as modules and subsystems for the information and communications industry, today announced that its PureAccess-R5 bending loss insensitive single mode optical fiber is fully compliant with the new ITU-T G.657.B3 recommended standard for macrobend at a 5-mm radius for efficiently routing optical drop cables and other applications inside the home and Multiple Dwelling Units (MDUs).

23 Feb 2010

ASML Ships its 100th TWINSCAN XT:1900 Lithography System

ASML Holding NV (ASML)(NASDAQ:ASML)(Amsterdam:ASML) today announced the shipment of its 100th TWINSCAN XT:1900 series lithography system, capable of imaging industry-leading chip features as small as 38 nanometers.

23 Feb 2010

ON Semiconductor Offers New Dimmable LED Driver Solutions for Lighting Applications

ON Semiconductor (Nasdaq: ONNN), a premier supplier of high performance, energy efficient silicon solutions for green electronics, today announced the launch of a new power factor corrected dimmable LED driver for residential and commercial lighting applications.

23 Feb 2010

Carl Zeiss' Workshop on Aberration Corrected Electron Microscopy Attracts Good Response

A workshop on aberration corrected electron microscopy was sponsored recently by Carl Zeiss at Harvard University. The workshop attendance was unexpectedly high. Organizers had to move the roughly 100 attendees to a much larger lecture hall than originally planned.

23 Feb 2010

Misumi Introduces New Mounting Devices for CCD Cameras and Photoelectric Sensors

Misumi USA, Inc., a subsidiary of Misumi Corporation, part of Misumi Group, Inc. (Tokyo: 9962), has introduced a series of new products to its comprehensive lines of Posts, Stands and Clamps.

23 Feb 2010

Applied Materials' Seminar Explores Latest Advancements in Next Generation Lithography

Current optical lithography techniques for patterning semiconductor devices are rapidly reaching their limits. While immersion lithography with double patterning appears to be extendible to 19nm for flash memory devices and potentially to 15nm logic designs, EUV lithography is viewed as the most likely successor.

23 Feb 2010

Ahura Releases Next Generation Raman Spectrometers for Security Applications

Ahura Scientific, Inc., the leader in field-deployed analytical instruments for human health and public safety, today announced the release of its next generation Raman platform for safety and security applications. Designed for the rapid identification of unknown solids and liquids, FirstDefender® RM and FirstDefender RMX build on the success of the flagship FirstDefender to deliver advanced new features and capabilities.

23 Feb 2010

James River Assembly Church Deploys Axis Network Cameras at Missouri Campuses

Axis Communications, the global leader in the network video market, today announced that James River Assembly Church, the second largest Assemblies of God Church in the United States, has deployed more than 350 Axis network cameras and encoders inside and outside of the church and community facilities at its two campus locations in southwest Missouri.

23 Feb 2010

Finelite's LED Desk Lamp Receives Best in Class Honors in NGL Design Competition

An LED desk lamp, the Curve by Finelite, won Best in Class in the 2009 NGL Design Competition. Two other Finelite entries also received recognition as winners, the Muro wall wash luminaire and the LED Undercabinet.

23 Feb 2010

SolarFrameWork to Supply CoolPly Solar Roofing Components to Johns Manville

Johns Manville (JM), a leading global manufacturer of an extensive line of energy-efficient building products, today announced it has reached an agreement with SolarFrameWorks, a premier photovoltaic solutions company, for SolarFrameWorks to supply its proprietary Building Integrated Photovoltaic (BIPV) CoolPly™ solar roofing components to JM. Johns Manville will market these products through its business entity, the JM E3 Company, more informally known as JM E3co.

23 Feb 2010

GIC Introduces Jason Wu Designed Point-and-Shoot Digital Camera Collection

General Imaging (GIC), exclusive licensee of GE branded digital cameras, today unveiled "Create by Jason Wu,"

22 Feb 2010

New Enhanced KODAK Picture Kiosk Software Writes Picture CDs 33% Faster

Building on the connected ecosystem solutions announcement yesterday, the Eastman Kodak Company (NYSE: EK), world leader in photo systems and inventor of the photo kiosk category, today introduced a series of powerful new features and enhancements to its KODAK Picture Kiosk software, including a number of industry firsts.

22 Feb 2010

AMS Finalises Distribution Agreement with Interfiber Analysis for Refractive Index Profiler

AMS Technologies has finalised a distribution agreement for all European countries with Interfiber Analysis, NJ, USA.

22 Feb 2010

Sony to Exhibit Innovative Digital Imaging Products at PMA 2010

Sony is exhibiting an array of innovative digital imaging products at the Photo Marketing Association (PMA) 2010 International Convention, including a concept model of the new compact á (alpha) DSLR camera system that employs an Exmor™ APS HD CMOS sensor, which provides full AVCHD video capability

22 Feb 2010

Eastman Kodak Introduces New Software and Papers for Retailers, Photographers and Professional Laboratories

Eastman Kodak Company (NYSE: EK) today introduced new software and papers to help retailers, photofinishers and professional labs manage and create premium output, while protecting current investments. The solutions -- which enable everything from premium photo books and postcards to high-end commercial prints -- share common themes of increasing workflow efficiency, maximizing current investments and most importantly, trusted Kodak quality.

22 Feb 2010