Feb 24 2010
Specialists from Malvern Instruments are contributing to the Pittcon 2010 (28 February – 5 March 2010; Orlando, FL, USA) technical program across multiple disciplines with a series of podium and poster presentations. These include two presentations that discuss one of the most widely used techniques for particle size analysis, laser diffraction. Both draw on Malvern’s expertise in applications development and understanding to help further the practical implementation of this key analytical tool, which is now the particle sizing technique of choice across many industries.
Making a podium presentation, Applications Manager Dr. Alan Rawle will consider the requirements for optical model selection when using laser diffraction, making reference to ISO-13320:2009, the updated standard for laser diffraction measurements. His talk will consider the importance of particle optical properties in defining the limits of applicability of the available models, showing how the particle absorption is important in guiding users towards a correct selection. Dr Rawle will present experimental data that clearly illustrate the application of each model, with the aim of helping users of this technique gain a greater understanding of its application in practice. His presentation is at 2.00pm on Thursday 4 March in Room 308A (3090-1).
In a poster presentation - ‘Particle size: Laser diffraction versus Dynamic Light Scattering’- on the same day, Dr. Kapeeleshwar Krishana, Applications Scientist at Malvern Instruments, will compare the dynamic ranges for both techniques, providing a realistic assessment of the capabilities and limitations of each. This type of understanding is essential in selecting the most appropriate technique for specific particle sizing applications.
Source: http://www.malvern.com/