Product Based on Hazard-Detection Technology Developed for U.S. Army

JMAR Technologies, Inc. a leading developer of advanced laser, photonics and detection products, today announced that it will unveil the first commercial prototype of its double-pulse laser system at next week's Conference on Lasers and Electro-Optics (CLEO) in San Jose, California.

The prototype is a shoebox-sized portable system based on JMAR’s proprietary BriteLight™ system, and developed by JMAR in response to a U.S. Army issued SBIR grant to support research for remote detection of hazardous materials, drugs and other biological or chemical substances. The Company’s move to commercialize its double-pulse system follows a successful 2007 demonstration of its ability to provide full control of first to second beam pulses while maintaining exceptional beam quality. LIBS testing conducted in JMAR’s laser lab has shown a consistent 10X signal enhancement on copper and up to 25X on aluminum.

“The debut of this man-portable double-pulse system with direct application in multiple commercial markets represents one of the most significant milestones in our company’s history,” said JMAR President and CEO, C. Neil Beer, PhD. “Although we will continue the development of this system for the armed forces, the portability feature of our new system should enable us to begin penetration of the much larger commercial market. Also, there is no better place than CLEO, the foremost laser and opto-electonics industry event, for introducing this new product to the widest possible audience of knowledgeable customers.”

CLEO will be held at San Jose’s McEnery Convention Center from Sunday, May 4, through Friday, May 9, in conjunction with the Quantum Electronics and Laser Science Conference (QELS) and the Conference on Photonic Applications, Systems and Technologies (PhAST). Together, the conferences are expected to attract 6,000 engineers, scientists and other leaders in the fields of optics and photonics. JMAR (Booth #2417) and other companies will be exhibiting from Tuesday, May 6 through Thursday, May 8.

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