Axic, Inc. was founded in 1980 as a company to develop surface science equipment for the semiconductor, electronics, and general scientific community. The early stages of the company were involved with determining future equipment requirements for the semiconductor industry which could be filled by a small company with strategic knowledge of surface measurement requirements.
Initial developments focused on x-ray and electron beam analysis of surfaces for compositional and film thickness analysis. These developments lead to the introduction of a stand alone x-ray fluorescence unit which was easily operated by fab personnel for the measurement of film composition and thickness. Axic, Inc. now produces 3 XRF systems for coatings analysis in both development and production applications for the semiconductor, magnetic, and superconductor industries.
In 1992, Axic entered the market of producing laser based reflectometers for the measurement of film thickness, index of refraction, and film absorption properties of transparent/translucent films for the semiconductor, optical and magnetics industries.
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