Posted in | News | LEDs | Semiconductors

SUSS MicroTec Unveils MA100e Gen2 Lithography System for HB-LED Production

Provider of devices for the semiconductor industry, SUSS MicroTec has unveiled the upgraded MA100e mask aligner for developing high-brightness light emitting diodes (HB-LEDs).

The MA100e is based on the company’s mask aligner design and processes wafers with a maximum length of four inches. It allows a throughput of 145 wafers for every hour with decreased cycle times.

SUSS MicroTec, by developing the MA100e Gen2 mask aligner, has designed an automatic mask aligner solution to meet the LED industry’s cost-sensitive technology needs. Pre-alignment options and high intensity exposure optics lessen the process time, whereas functionalities such as proximity exposure for high resolution enhance cost-efficiency and yield. The MA100e Gen2 mask aligner offers swift time-to-market. It also provides enhanced process scalability for the latest device designs.

President of SUSS MicroTec, Frank Averdung stated that the upgraded MA100e mask aligner would help customers to enhance production efficacy and decrease the cost per lumen.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.