Oct 22 2008
Micronic Laser Systems AB, a leading global supplier of laser pattern generators for photomasks, today introduced the FPS5300, a pattern generator for producing the large area photomasks needed in the expanding field of advanced packaging as well as other electronic applications.
The FPS5300 is based on Micronic's industry-standard pattern generators for display photomasks, and is adapted to the electronic industry's need for a wide range of photomask sizes and feature resolutions.
The tool introduces a new sub-micron writing level, addressing more photomask applications that require high resolution and exacting image control. At the same time, it standardizes the extreme throughput capability of the FPS platform for rapid patterning of photomasks with larger features. Switching between writing levels is fully automated, simplifying tool operation and optimizing production flow.
"Micronic is committed to serving a broad range of photomask applications" said Sven Löfquist, President and CEO of Micronic Laser Systems AB. "The FPS5300 provides photomask manufacturers the flexibility of optimizing writing speed and resolution for the application at hand."