micro resist technology was founded in 1993 by scientists and engineers with many years of experience in basic research and industrial application in the field of photochemistry, and the development and production of semiconductor technologies for optoelektronics, electonics, devices and storage circuits.
In October 1997 the quality management system of micro resist technology was DIN EN ISO 9001 certified.
This product profile describes the properties and applications of the ProMetric® I-SC Solution Imaging Colorimeter.
The Filmetrics F20 benchtop film thickness measurement tool is a general purpose instrument for measuring thickness and refractive index.
Dynamic characterization of MEMs devices is achieved by Micro System Analyzer MSA-650 IRIS.
Dr. Keith Paulsen
AZoOptics speaks to Dr. Keith Paulsen about the importance of breast cancer detection and the introduction of his team's deep-learning algorithm that associates spatial images of tissue optical properties with optical signal patterns measured during an imaging experiment or patient exam.
Prof. Simon Scheuring & Dr. Alma P. Perrino
AZoOptics speaks to Prof. Simon Scheuring & Dr. Alma P. Perrino about their recent research using a new line-scanning high-speed atomic force microscopy technique. The method helps characterize the single-molecule kinetics of wild-type bR (bR-WT) exposed to continuous light and short light pulses.
R. Bruce Weisman
AZoOptics interviews R. Bruce Weisman from Rice University in Texas, US, who has discovered fluorescence from silicon nanoparticles in cement and how it can be used to reveal early signs of damage in concrete structures.