Cymer, the world's leading supplier of excimer light sources, delivers the deep ultraviolet (DUV) photolithography sources that are essential to today's semiconductor marketplace. Known for its highly narrowed bandwidths, higher processing speeds, and reliability, Cymer light sources are key in enabling technology which has allowed the semiconductor industry to meet the exact specifications and manufacturing requirements for volume production of today's most advanced semiconductor chips.
EUV Lithography Light Source Technology
Cymer Qualifies New Light Source for Immersion Lithography Systems
Cymer Qualifies New Argon Fluoride (ARF) Light Source, Reducing Edge Placement Error for the Most Advanced Nodes
Cymer Develops Laser Focus Drilling Technology for Immersion Light Sources
The Monarc Pro T System turns any microscope into an optically-coupled microscope, enabling in-situ discovery for photoactive catalyst studies.
Discover the NAN™ Electrophysiology focusing nosepiece microscope by Sutter instruments.
The Total Absolute Measurement System (TAMS) unit allows you to choose the right detector for angular-dependent measurements of optical properties of thin and thick samples.
In this interview, AZoOptics speaks with Teledyne Dalsa about the key roles of optics when it comes to Machine Vision Systems.
Dr. Mustafa Kansiz
In this interview conducted at Pittcon 2023 in Philadelphia, Pennsylvania, we spoke to Mustafa Kansiz, Director of Product Management and Marketing at Photothermal Spectroscopy Corp, about O-PTIR, a new and alternative infrared spectroscopy method.
Professors Susmu Noda and Menaka De Zoysa
In a new interview, AZoOptics talks with Professors Susmu Noda and Menaka De Zoysa about their research presenting a new nonmechanical 3D Lidar system.