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IPG Purchases Additional GEN2000® Production Molecular Beam Epitaxy System

Veeco Instruments Inc. announced today that IPG Photonics Corporation (IPG), purchased an additional GEN2000® Production Molecular Beam Epitaxy (MBE) System to add to their fleet of Veeco MBE systems.

Located in Oxford, Massachusetts, IPG will use the GEN2000 for high-volume manufacturing of laser diodes for fiber lasers. IPG Photonics Corporation is the world leader in high-power fiber lasers and amplifiers and now utilizes multiple Veeco MBE systems in its laser production operations. Veeco is the market leader in MOCVD, MBE, Ion Beam and other advanced thin film process technologies.

“Veeco’s GEN2000 is the perfect complement to our existing set of Veeco MBE systems because of its superior throughput and low production costs,” said Dr. Alex Ovtchinnikov, Senior Vice President, Components at IPG Photonics. “Having the ability to transfer production methods from our other Veeco MBE systems means we can ramp laser diode production quickly and reliably to meet increasing demand for our fiber lasers.”

With their excellent performance, low power consumption and favorable ownership costs, fiber lasers are becoming the cutting and welding method of choice for materials processing applications, particularly in the automotive industry, according to a report on the laser cutting market from Markets and Markets. As the technology continues to advance, fiber lasers are gaining adoption in other industries including semiconductor processing, 3-D printing and smartphone manufacturing.

“IPG is the clear leader in fiber laser production and has been utilizing our production MBE systems for years,” said Jim Northup, Vice President, General Manager for Veeco’s MBE Operations. “The GEN2000 delivers the highest throughput and lowest cost of ownership MBE technology in the industry, making it the ideal system to manufacture IPG’s high performance laser diodes.”

About GEN2000 Production MBE System

The GEN2000 MBE System delivers exceptional throughput and cost of ownership for high-capacity production applications. Its cluster tool design provides the industry’s most cost effective 7x6” epiwafer growth of devices such as lasers, multi-junction solar cells, and pseudomorphic high-electron-mobility transistors (pHEMTs). Its cluster tool architecture minimizes clean-room space and downtime attributed to maintenance and allows for growth of different materials in connected modules.



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