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Cymer Shows 100W Extreme UV Burst Power

Cymer, Inc., the world's leading supplier of excimer laser light sources used in semiconductor manufacturing, announced the company reached its goal of demonstrating 100 watts of extreme ultraviolet (EUV) burst power at the 2007 International EUVL Symposium held recently in Sapporo, Japan.

The accomplishment further reinforces Cymer’s commitment and leadership in the commercialization of EUV technology and at Cymer’s Asia Pacific Lithography Symposiums, Cymer will present more material on this most recent achievement.

“Our EUV research and development &ndash which spans nearly a decade &ndash continues its steady climb with this announcement,” said Bob Akins, chief executive officer of Cymer. “This demonstration of 100 watts burst power is a reflection of our passion and dedication to leading the industry and in making EUV a capable and economically viable lithography technology.”

Cymer has reached all of its EUV power performance milestones using a laser produced plasma (LPP) system consisting of multi-staged carbon dioxide (CO2) laser and tin (Sn) droplet target, which has been in operation since June 2006. In the first quarter of 2007, Cymer also disclosed a breakthrough in debris mitigation technology that will substantially extend the lifetime of the multi-layer-mirror (MLM) collector, which will enable an economically viable cost of operation, a key component of the source system. These rapid advancements in technology validate the LPP architecture’s ability to scale to high volume manufacturing (HVM) performance requirements.

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