Lithography - AZoOptics Search

SEMATECH to Demonstrate Extreme Ultraviolet Lithography Advancement at SPIE

News - 18 Feb 2010

Critical issues and potential solutions in preparing extreme ultraviolet lithography (EUVL) for high-volume manufacturing will be explored by SEMATECH technologists at the SPIE Advanced Lithography...

Annual Meeting of Lithography Industry to be Held in San Jose, California

News - 6 Feb 2010

Bolstered by indicators predicting market growth for the industry, the lithography community is preparing for its annual gathering at SPIE Advanced Lithography. The meeting will be held 21-25 February...

Vistec Electron Beam Joins MIET in Electron-Beam Lithography Project

News - 15 Dec 2009

Vistec Electron Beam GmbH is pleased to announce that it has stepped into a joined electron-beam lithography project with the renowned Moscow Institute of Electronic Technology (MIET). MIET, one of...

New Way of Creating Computer Chips that Could Revitalize Optical Lithography

News - 22 Oct 2008

Engineers at the University of California, Berkeley, are reporting a new way of creating computer chips that could revitalize optical lithography, a patterning technique that dominates modern...

SemiLEDs Orders Multiple Lithography Systems from Ultratech

News - 14 Oct 2008

Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices, today announced it received a multiple-system order from U.S.-based SemiLEDs...

Complex Nanoscale Structures Fabricated on Various Substrates using Nanoimprint Lithography

News - 8 Oct 2007

Nanoimprint lithography (NIL) has developed into a key technique for the fabrication of polymer nanopatterns and three-dimensional (3D) nanostructures. At its core, NIL is a simple nanometer scale...

EV Group

Supplier Profile

EV Group (EVG) is a recognized technology and market leader for wafer processing equipment. The company targets advanced packaging, compound semiconductor/LED and silicon-based power devices, MEMS,...

Laser Light Source Extends Cymer's Leadership in the Dry ArF Market

News - 3 Sep 2008

Cymer, Inc., the market's leading developer of light sources used to create advanced semiconductor chips, has unveiled the XLR 500d-an argon fluoride (ArF) laser light source for 32 nanometer (nm)...

TWINSCAN XT:1950i Enables World-Leading Sub 40 nm Volume Chip Imaging

News - 15 Jul 2008

ASML Holding NV (ASML) announces today its newest TWINSCANTM XT:1950i lithography system using a 1.35 NA lens – increasing the performance of its immersion lithography systems by 25%. The system...

Advance Could Lead to Next-Generation Solar Cells

News - 8 Jul 2008

MIT researchers have achieved a significant advance in nanoscale lithographic technology, used in the manufacture of computer chips and other electronic devices, to make finer patterns of lines over...