Ellipsometric Spectra Analysis at the Time of Layer Deposition - inSE-1000

The inSE-1000 is the new in situ Spectroscopic Ellipsometer launched by Semilab. This tool provides rapid access to layer thicknesses and optical properties through ellipsometric spectra analysis during etch processes or layer deposition carried out in vacuum chambers, like the ALD chamber. It can be also set up on load lock, cooling and transfer chambers for post-process investigation without disturbing the vacuum.

The inSE-1000 belongs to Semilab’s ellipsometry tool range built specifically for measurement on vacuum chambers at the time of treatment or deposition processes conducted in load locks.

The arms of the ellipsometer can be also effortlessly mounted and positioned on the vacuum chamber or an offline test bench for a detailed examination of the final product. The additional systems and electronic components are placed in a cabinet, which can be located close to the deposition tool. The Ethernet interface enables on-demand measurement sequences with the deposition tool and the two-way communication protocol.

Key Features and System Specifications of the inSE-1000

  • Compact arms
  • Optical fiber provides 75 W, short arc Xenon lamp
  • Beam divergence < 0.2° (no focusing, in parallel beam)
  • Spectral resolution for quick mode
  • CF-40 vacuum port interface
  • Rotating compensator optics


  • Each layer is modeled with proven techniques such as phase node model, dispersion laws, periodic layers, alloy model, anisotropic layer evaluation, or user-specified free formula
  • Ethernet-based communication protocol with the deposition tool computer
  • The biggest (k, n) database
  • Direct visualization of the measurement data and the fitting results — thickness and optical properties

InSE 1000 on Picosun ALD.

InSE 1000 on Picosun ALD

InSE 1000 on ALD.

InSE 1000 on ALD.

Ex situ bench.

Ex situ bench.

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