Alluxa, Inc., a global leader in high-performance optical coatings, filters, and thin-film deposition technologies, is pleased to announce a breakthrough using its proprietary Sirrus™ Plasma Physical Vapor Deposition (PVD) process that enables fully dense dielectric optical coatings with very low stress on thin substrates.
ULTRA Low-Stress process shows a minimal change in flatness between uncoated (left) and coated substrates (right). Image Credit: Alluxa, Inc.
The innovative ULTRA Series thin-film dichroic filters are enhanced to offer a lower-stress alternative with industry-leading flatness performance. The same Alluxa ULTRA Series steep edges, high transmission, and superior reflection is available with improved intrinsic stress, resulting in fewer design constraints and optimal instrument performance. The new low-stress Sirrus coating process enables ultra-flat dichroics on substrates <1.0 mm, ideal for an array of microscopy, medical, and space-based applications.
Peter Egerton, President of Alluxa notes, “We are excited to bring a new capability like this to our customers. High performance, steep edge dichroics on ultra-thin substrates has been a frequent request over the years and the engineering team has worked hard to conceptualize and innovate a solution.”