Equipment | Optical Metrology Equipment

Optical Metrology Equipment

Optical metrology is the characterisation of physical surface properties such as dimensions, flatness, curvature, roughness etc. These may be determined by various contact or non contact methods and are non-destructive in nature. They can be used to determine whether or not an optical component will perform to its prescribed specifications.
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Featured Equipment
Zygo's LivePhase – Real-Time Optical Alignment System
LivePhase is a real-time optical alignment system from Zygo. LivePhase acquisition provides Zernike feedback and real-time phase (with optional fringe overlay) for active monitoring of toleranced or targeted adjustments in order to bring an optical system into specification.
Other Equipment
Zygo’s Electro-Optics Group
Zygo’s Electro-Optics Group has the capability to design and fabricate complex electro-optical products and assemblies utilized in the industrial, semiconductor, defense, life sciences markets.
TA51 Visual Autocollimator from Taylor Hobson
The TA51 has a broad range and also maintains a high measurement accuracy. This system is popular in measurement and also in calibrating indexing heads and other angular devices such as polygons and clinometers.
Interferometers - µPhase® by TRIOPTICS
µPhase® interferometers offer objective and precise measurement results of surface and wavefront measurements - quickly and reliably. µPhase® interferometers are compact, small and lightweight digital tools which can be used in almost any working environment. These measuring devices are perfectly complemented by the µShape™ measurement and analysis software to fulfill the highest expectations of quality management.
TriAngle 3D- Precision Electronic Autocollimator by TRIOPTICS
The TriAngle 3D electronic autocollimators represent high-precision angle measurement systems for high demands on angle resolution and measuring accuracy.
Form Talysurf PGI Dimension – Precision Optical Metrology from Taylor Hobson
The novel Talysurf PGI Dimension is a suitable dedicated metrology instrument that enables precision measurement of 3D form of steep and shallow aspherical lenses and moulds from less than 2mm and up to 200mm diameter.
PlasCalc Plasma Monitoring + Control Systems from Ocean Optics
The Ocean Optics PlasCalc Plasma Monitoring System that can measure plasma emission from 200 to 100 nm in just 3 milliseconds.
Ultra Dual Axis Digital Autocollimator from Taylor Hobson – For Straightness, Twist, Squareness, Parallelism, Flatness, Polygons and Indexing Tables
The new ultra dual axis autocollimator uses latest CCD technology and is a highly versatile instrument that offers high stability and accuracy over a broad application range. A tablet PC controls the digital autocollimator with a clear touch-screen software.
Zygo Mini Interferometer for Reliable Production Metrology
The Zygo Mini interferometer is engineered to fulfill the unique specifications of production metrology.
Form Talysurf PGI 840 – High-Precision Metrology for Integration with Machining for Aspheric Optics from Taylor Hobson
Ultra-high precision processes such as single-point diamond turning enable aspheric lenses to be manufactured with small tolerances down to small fractions, reducing wave front aberrations to insignificant levels.
CCI HD Ultra Precision 3D Optical Profiler from Taylor Hobson
The novel CCI HD precision 3D optical profiler combines excellent non-contact dimensional measurement capability with advanced thin and thick film technology. The optical profiler features easy and quick high resolution measurement.
Form Talysurf PGI Optics - Premium Specification Measurement for Aspheric Optics from Taylor Hobson
The Form Talysurf PGI OpticsTaylor Hobson is a premium specification measurement system for the small to medium sized aspheric optics market. It has been developed for applications wherein optimum component quality and consistency cannot be compromised.
Thin Film Reference Wafer from Ocean Optics
The Ocean Optics Silicon-Silicon Dioxide (Si-SiO2) Reference Wafer can be used to measure the thickness of substrates such as optical layers or silicon wafers.
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